At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.

نویسندگان

  • P Naulleau
  • K A Goldberg
  • E M Gullikson
  • J Bokor
چکیده

The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.

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عنوان ژورنال:
  • Applied optics

دوره 39 17  شماره 

صفحات  -

تاریخ انتشار 2000